Vaisala in-line process refractometers are uniquely suited to CMP slurry management by controlling batch-to-batch variation and dilution of the slurry as well as blending of the oxidizing agent such as H2O2. This level of control is accomplished by using refractive index to continuously monitor liquid concentration, without being impeded by bubbles, ensuring a repeatable CMP process. By verifying that slurries consistently meet requirements, these instruments allow manufacturers to extend equipment uptime, maximize raw material usage, and reduce maintenance costs.
Register for this webinar to learn why Vaisala process refractometers have been installed by hundreds of semiconductor manufacturers worldwide. We’ll review the technology behind our measurement solutions and share common applications before sharing sample use cases from fabricators.
By accurately controlling and reducing wafer cleaning chemical consumption, manufacturers can maximize semiconductor throughput. Measuring CMP slurry concentration with Vaisala Process Refractometers also prevents defective chemicals from entering the process, protecting valuable fabrication equipment.
The CMP process relies heavily on a precise slurry mixture, and directly impacts semiconductor manufacturability. Vaisala in-line process refractometers can not only control this early phase of production, but also increase equipment uptime and chemical shelf-life.