Are you struggling with inconsistent etching results or reduced yield due to unstable KOH concentration in wet etching?
Join this free 20-minute webinar.
Controlling potassium hydroxide (KOH) concentration is critical for precision and yield in silicon wafer processing. Etching rate depends on the KOH concentration and temperature.
In this Vaisala webinar, Product Manager Visa Lukkarinen shares expert insights on how inline refractometry brings accuracy, robust process control, and operational efficiency in wet etching applications.
Process engineers and managers in the semiconductor industry
Quality and operations professionals focused on yield and efficiency
Anyone interested in advanced liquid measurement technologies
If you have already attended or registered for this webinar, please click here. Otherwise, please watch the recorded webinar by filling the form.
Visa Lukkarinen
Product Manager
Visa Lukkarinen has 5 years of experience with refractometers in various roles, encompassing both technical and commercial aspects. As Product Manager, Visa drives the commercial success of Liquid Measurement products and has ownership of their R&D projects. Visa holds a Master of Science degree in Electrical Engineering from Aalto University, Finland.
Pressure, temperature, humidity, and liquid concentration measurements for increased yield, safety, and best-performing semiconductor products.
Measure safely and accurately the concentrations of aggressive chemicals: hydrochloric acid (HCI), sodium hydroxide, sodium chloride, sulphuric acid, and hydrofluoric acid.
A compact refractometer with an ultra pure modified PTFE flow cell body for semiconductor liquid chemical processes. Connected to the process by a ¼ — 1 inch pillar or flare fitting.