半导体制造

The composition of the slurry used in the chemical mechanical polishing (CMP) processing step greatly impacts wafer quality. Vaisala's inline process refractometers enable real-time monitoring of slurry composition, ensuring batch-to-batch consistency and optimal wafer quality.

流程工业高纯气体案例
纯气体生产或半导体制造等某些要求严苛的工业流程，需要非常精确地测量微量水分含量。

随着市场环境的优化升级和国家政策的有利驱动，新能源汽车、智能驾驶、智能终端和5G等下游行业对集成电路的需求激增。而作为典型的高精尖产业，集成电路的制造对生产环境和工艺的要求极为苛刻。其中，洁净室的建设是集成电路制造中的关键环节，对最终产品的性能具有至关重要的影响。

维萨拉 K‑PATENTS 半导体行业用折光仪为半导体制造环境设计。该仪器尺寸小且不含金属，因此适合在不影响工艺的情况下测量化学物质。

Accurate and fast RI and RH measurements for optimized CMP tool performance  

Did you know that the refractive index or RI measurement with an inline process refractometer is a safe, cost-effective,
real-time, low-maintenance process monitoring method to accurately determine wet chemical concentrations? 

In this blog, we look at Vaisala’s range of humidity and pressure sensors that ensure accurate measurements for manufacturers of the machines used to produce semiconductors.

为避免产品质量和产量出现问题，在半导体制造过程中必须尤为谨慎地监测湿度和温度水平。维萨拉的高精度测量解决方案适用于制造工艺流程中的关键步骤，响应非常迅速，且能够适应各种环境条件。

Register for this webinar to learn why Vaisala process refractometers have been installed by hundreds of semiconductor manufacturers worldwide. We’ll review the technology behind our measurement solutions and share common applications before sharing sample use cases from fabricators.

在半导体和电池制造工艺流程中，杂质会导致产品质量大幅下降。尤其是水污染，因为水分蒸发产生的热量和膨胀产生的压力会引起各种问题，从而导致半导体和电池的质量和性能下降。